"フォトレジスト" meaning in All languages combined

{
  "etymology_templates": [
    {
      "args": {
        "1": "ja",
        "2": "en",
        "3": "photoresist"
      },
      "expansion": "English photoresist",
      "name": "bor"
    }
  ],
  "etymology_text": "From English photoresist.",
  "forms": [
    {
      "form": "fotorejisuto",
      "tags": [
        "romanization"
      ]
    }
  ],
  "head_templates": [
    {
      "args": {},
      "expansion": "フォトレジスト • (fotorejisuto)",
      "name": "ja-noun"
    }
  ],
  "lang": "Japanese",
  "lang_code": "ja",
  "pos": "noun",
  "senses": [
    {
      "categories": [
        {
          "kind": "other",
          "name": "Japanese entries with incorrect language header",
          "parents": [
            "Entries with incorrect language header",
            "Entry maintenance"
          ],
          "source": "w"
        },
        {
          "kind": "other",
          "name": "Japanese katakana",
          "parents": [],
          "source": "w"
        },
        {
          "kind": "other",
          "name": "Japanese links with redundant wikilinks",
          "parents": [
            "Links with redundant wikilinks",
            "Entry maintenance"
          ],
          "source": "w"
        },
        {
          "kind": "other",
          "name": "Japanese terms with redundant sortkeys",
          "parents": [
            "Terms with redundant sortkeys",
            "Entry maintenance"
          ],
          "source": "w"
        }
      ],
      "examples": [
        {
          "english": "With these techniques, photoresist is used during the circuit formation process, and is usually removed after processing so that no material from the process remains on the PWB.",
          "ref": "2009, Akamatsu Kiyoshi, Kankōsei jushi no ōyō gijutsu [Practical techniques for photosensitive resin], page 119",
          "roman": "Korera no kōhō de fotorejisuto wa kairo keisei purosesu de mochiirare, tsūjō wa kakō ato hakurisarete purinto-kiban ue ni wa nokoranai purosesu zairyō de aru.",
          "ruby": [
            [
              "工",
              "こう"
            ],
            [
              "法",
              "ほう"
            ],
            [
              "回",
              "かい"
            ],
            [
              "路",
              "ろ"
            ],
            [
              "形",
              "けい"
            ],
            [
              "成",
              "せい"
            ],
            [
              "用",
              "もち"
            ],
            [
              "通",
              "つう"
            ],
            [
              "常",
              "じょう"
            ],
            [
              "加",
              "か"
            ],
            [
              "工",
              "こう"
            ],
            [
              "後",
              "あと"
            ],
            [
              "剥",
              "はく"
            ],
            [
              "離",
              "り"
            ],
            [
              "PWB",
              "プリントきばん"
            ],
            [
              "上",
              "うえ"
            ],
            [
              "残",
              "のこ"
            ],
            [
              "材",
              "ざい"
            ],
            [
              "料",
              "りょう"
            ]
          ],
          "text": "これらの工法でフォトレジストは回路形成プロセスで用いられ,通常は加工後剥離されてPWB上には残らないプロセス材料である。"
        }
      ],
      "glosses": [
        "photoresist"
      ],
      "id": "en-フォトレジスト-ja-noun-BYrcLq5N",
      "links": [
        [
          "photoresist",
          "photoresist"
        ]
      ],
      "wikipedia": [
        "ja:フォトレジスト"
      ]
    }
  ],
  "sounds": [
    {
      "ipa": "[ɸo̞to̞ɾe̞ʑisɨᵝto̞]"
    }
  ],
  "word": "フォトレジスト"
}

{
  "etymology_templates": [
    {
      "args": {
        "1": "ja",
        "2": "en",
        "3": "photoresist"
      },
      "expansion": "English photoresist",
      "name": "bor"
    }
  ],
  "etymology_text": "From English photoresist.",
  "forms": [
    {
      "form": "fotorejisuto",
      "tags": [
        "romanization"
      ]
    }
  ],
  "head_templates": [
    {
      "args": {},
      "expansion": "フォトレジスト • (fotorejisuto)",
      "name": "ja-noun"
    }
  ],
  "lang": "Japanese",
  "lang_code": "ja",
  "pos": "noun",
  "senses": [
    {
      "categories": [
        "Japanese entries with incorrect language header",
        "Japanese katakana",
        "Japanese lemmas",
        "Japanese links with redundant wikilinks",
        "Japanese nouns",
        "Japanese terms borrowed from English",
        "Japanese terms derived from English",
        "Japanese terms with IPA pronunciation",
        "Japanese terms with redundant sortkeys",
        "Japanese terms with usage examples"
      ],
      "examples": [
        {
          "english": "With these techniques, photoresist is used during the circuit formation process, and is usually removed after processing so that no material from the process remains on the PWB.",
          "ref": "2009, Akamatsu Kiyoshi, Kankōsei jushi no ōyō gijutsu [Practical techniques for photosensitive resin], page 119",
          "roman": "Korera no kōhō de fotorejisuto wa kairo keisei purosesu de mochiirare, tsūjō wa kakō ato hakurisarete purinto-kiban ue ni wa nokoranai purosesu zairyō de aru.",
          "ruby": [
            [
              "工",
              "こう"
            ],
            [
              "法",
              "ほう"
            ],
            [
              "回",
              "かい"
            ],
            [
              "路",
              "ろ"
            ],
            [
              "形",
              "けい"
            ],
            [
              "成",
              "せい"
            ],
            [
              "用",
              "もち"
            ],
            [
              "通",
              "つう"
            ],
            [
              "常",
              "じょう"
            ],
            [
              "加",
              "か"
            ],
            [
              "工",
              "こう"
            ],
            [
              "後",
              "あと"
            ],
            [
              "剥",
              "はく"
            ],
            [
              "離",
              "り"
            ],
            [
              "PWB",
              "プリントきばん"
            ],
            [
              "上",
              "うえ"
            ],
            [
              "残",
              "のこ"
            ],
            [
              "材",
              "ざい"
            ],
            [
              "料",
              "りょう"
            ]
          ],
          "text": "これらの工法でフォトレジストは回路形成プロセスで用いられ,通常は加工後剥離されてPWB上には残らないプロセス材料である。"
        }
      ],
      "glosses": [
        "photoresist"
      ],
      "links": [
        [
          "photoresist",
          "photoresist"
        ]
      ],
      "wikipedia": [
        "ja:フォトレジスト"
      ]
    }
  ],
  "sounds": [
    {
      "ipa": "[ɸo̞to̞ɾe̞ʑisɨᵝto̞]"
    }
  ],
  "word": "フォトレジスト"
}

{
  "called_from": "parser/1336",
  "msg": "no corresponding start tag found for </span>",
  "path": [
    "フォトレジスト"
  ],
  "section": "Japanese",
  "subsection": "noun",
  "title": "フォトレジスト",
  "trace": ""
}